Molecular formula: SiH4 content: ≥ 99.9999%
CAS No: 7803-62-5 package: cylinder tank
Application: silane has become the most important special gas used in semiconductor microelectronic process. It is used for the preparation of various microelectronic films, including single crystal film, microcrystalline, polycrystalline, silicon oxide, silicon nitride, metal silicide, etc. The microelectronic application of silane is still deepening
Development: low temperature epitaxy, selective epitaxy and heterogeneous epitaxy. Not only for silicon devices and silicon integrated circuits, but also for compound semiconductor devices (gallium arsenide, silicon carbide, etc.). It also has applications in the preparation of Superlattice Quantum Well materials. It can be said that silane is needed in almost all modern integrated circuit production lines. The purity of silane has a great impact on device performance and yield. Better devices need higher purity silane.