Molecular formula: H2SO4 content: 96 - 98%
CAS No: 7664-93-9 package: 4L / bottle 1000L / barrel tank
Usage: electronic grade sulfuric acid is one of the eight chemical reagents in the semiconductor industry. It is mainly used for wafer cleaning and etching. Its consumption ranks third. Wafer cleaning is very important in the production process of semiconductor components. It is carried out almost every two processes. In the temperature range of 90 ~ 125 ℃, sulfuric acid is a very effective cleaning agent. It can remove almost all inorganic residues and particles from the wafer. Carbon residues can be removed by adding oxidants (hydrogen peroxide, ammonium persulfate, nitric acid and ozone, etc.) to sulfuric acid. Because the hot sulfuric acid is in direct contact with the bare wafer surface, it must be as pure as possible, especially when producing semiconductor components.